
Complete complex defect determination based on self-developed algorithm Platform
Complex defect determination relies on a powerful algorithm Platform. Machine vision is based on the self-developed VM algorithm Platform to complete defect classification, measurement and logical arrangement, supporting the rapid deployment of multiple semiconductor scenarios.

Flexible orchestration of self-developed VM algorithm Platform
Classification and measurement of complex defects
Graphical rapid deployment
Overall plan for linkage with Industrial PCs
Subpixel detection of wafer surface particles, scratches and lithography alignment
High-speed detection of pin coplanarity, BGA ball placement and character AOI
Lead frame positioning, coating defects and appearance identification
Telecentric Lenses + Custom Light Source enables fluoroscopic Distortion measurement
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